Rapid fabrication of conducting ploy(vinylidene fluoride) surfaces using a 248 nm excimer laser

被引:0
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作者
Liu Y. [1 ]
Jiang Y. [1 ]
机构
[1] Institute of Laser Engineering, Beijing University of Technology
来源
关键词
Conducting layer; Direct etching technique; Excimer laser; Laser technique; Ploy(vinylidene fluoride);
D O I
10.3788/CJL201138.0406002
中图分类号
学科分类号
摘要
A rapid fabrication method for conducting poly(vinylidene fluoride) by creating active centre using KrF excimer laser direct etching technique is demonstrated. Study shows that the etching point-defects and line-defects perform active centre function for facilely controlling conducting layer when laser irradiation decreases the laser threshold. The results of laser scanning confocal microscope(LSCM) and scanning electron microscope(SEM), indicate that the 2D net-like microstructures surround the defects are the precursor of conducting layer, which significantly affect the velocity of preparation. The effect of laser thermal cross-linking reaction and laser irradiation cross-linking reaction together contributes to the rapid formation of great conducting layer.
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