Nanoscale stability of two-and three-dimensional defects in Cu/Ag-Mo thin films

被引：0
|
作者：
Csiszár, G. [1 ]
Makvandi, A. [2 ]
Mittemeijer, E.J. [1 ,2 ]
机构：
[1] Max Planck Institute for Intelligent Systems, Heisenbergstrasse 3, Stuttgart,D-70569, Germany
[2] Institute for Materials Science, University of Stuttgart, Heisenbergstrasse 3, Stuttgart,D-70569, Germany
来源：
Journal of Applied Crystallography | 2017年 / 50卷 / 01期
关键词：
537.1 Heat Treatment Processes - 543.3 Molybdenum and Alloys - 544.2 Copper Alloys - 547.1 Precious Metals - 641.1 Thermodynamics - 741.3 Optical Devices and Systems - 761 Nanotechnology - 933.1 Crystalline Solids;
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页码：152 / 171
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