Radiation resistant low bandgap InGaAsP solar cell for multi-junction solar cells

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作者
机构
[1] Khan, Aurangzeb
[2] Yamaguchi, Masafumi
[3] Dharmaras, Nathaji
[4] Yamada, Takashi
[5] Tanabe, Tatsuya
[6] Takagishi, Shigenori
[7] Itoh, Hisayoshi
[8] Ohshima, Takeshi
[9] Imaizumi, Mitsuru
[10] Matsuda, Sumio
来源
Khan, A. (khan_zeb@hotmail.com) | 2001年 / Japan Society of Applied Physics卷 / 40期
关键词
Activation energy - Concentration (process) - Energy gap - Metallorganic chemical vapor deposition - Semiconducting indium compounds - Space applications;
D O I
10.1143/jjap.40.l728
中图分类号
学科分类号
摘要
We have explored the superior radiation tolerance of metal organic chemical vapor deposition (MOCVD) grown, low bandgap, (0.95 eV) InGaAsP solar cells as compared to GaAs-on-Ge cells, after 1 MeV electron irradiation. The minority carrier injection due to forward bias and light illumination under low concentration ratio, can lead to enhanced recovery of radiation damage in InGaAsP n+-p junction solar cells. An injection anneal activation energy (0.58 eV) of the defects involved in damage/recovery of the InGaAsP solar cells has been estimated from the resultant recovery of the solar cell properties following minority carrier injection. The results suggest that low bandgap radiation resistant InGaAsP (0.95 eV) lattice matched to InP substrates provide an alternative to use as bottom cells in multi-junction solar cells instead of less radiation ressitant conventional GaAs based solar cells for space applications.
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