Characterization of TiO2 photocatalytic thin films prepared by radiofrequency sputtering

被引：0
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作者：
Zheng, Shukai [1 ]
Hao, Weichang [1 ]
Pan, Feng [1 ]
Zhang, Junying [1 ]
Wang, Tianmin [1 ]
机构：
[1] Beijing Univ. of Aero. and Astron., Beijing 100083, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2004年 / 33卷 / 07期
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摘要：
TiO2 thin films were prepared on microscope glass slides by radiofrequency magnetron sputtering method under different flow ratios of Ar and O2 gases. The films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), Raman spectroscopy and UV-VIS spectrophotometer. The results indicated that the film prepared under the flow ratio of Ar : O2 = 20 sccm : 5 sccm has a higher photocatalytic activity.
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页码：752 / 754
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