Investigation into Linear Micropattern Generation using Electrochemical Micromachining

Micropatterned surfaces perform a significant role in the performance of microfabricated devices. Maskless electrochemical micromachining (EMM) is a unique prevalent technique for creating linear micropatterns with précised geometric dimensions and surface quality. However, this method is an advanced micromachining method for fabricating linear micropatterns in comparison to traditional EMM and photolithography, both being costly during mass production. This advanced method is more significant owing to the fabrication of many micropatterned samples with a reusable insulated tool. In this research work, SU-8 2150 mask is re-used many times and produced high quality micropatterns. The developed upward perpendicular cross flow system is utilized for identical micropattern production. Micropatterned properties such as material removal rate (MRR), width overcut, depth, and surface roughness (Ra) are influenced by EMM process variables such as voltage, machining time, inter-electrode gap (IEG), and electrolyte concentration. In addition, to determine the optimal parametric mix, an effective methodology known as Measurement of Alternatives and Ranking according to Compromise Solution (MARCOS) is used. The attained optimum process variables are voltage of 10V, IEG of 100μm, concentration of 15g/l, and machining time of 3 min for creation of good quality micropatterns. In addition, validation experimentation is conducted at identified optimal parametric values that confirm improved machining performance © 2022 School of Science, IHU. All rights reserved.