Mechanisms of near-ultraviolet, nanosecond-pulse-laser damage in HfO2/SiO2-based multilayer coatings

被引：3
|
作者：
Papernov, S. [1 ]
机构：
[1] Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14623-1299, United States
来源：
Chinese Optics Letters | 2013年 / 11卷 / SUPPL.1期
关键词：
Hafnium oxides - Optical materials - Silica - Ultraviolet lasers - Coatings - Melting point;
D O I：
10.3788/COL201311.S10703
中图分类号：
学科分类号：
摘要：
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