Stress properties of oxide thin films prepared by reactive electron beam evaporation

被引：0

作者：

Xiong, S.M. ^{[1
]}

Zhang, Y.D. ^{[1
]}

Tang, J.F. ^{[1
]}

机构：

[1] Inst. of Optics and Electronics, Chinese Acad. of Sci., Chengdu 610209, China

来源：

Guangdian Gongcheng/Opto-Electronic Engineering | 2001年 / 28卷 / 01期

关键词：

Absorption - Deposition - Electron beams - Evaporation - Heat treatment - Multilayers - Oxides - Stress analysis - Stresses - Thin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The stresses of oxide optical thin films prepared by reactive electron beam evaporation have been investigated in air. In order to find out the deposition technological parameters for reducing the stress of multi-layer film structure, the stresses of the oxide films such as TiO2, Ta2O5, SiO2, Al2O3 and HfO2 are tested. We discover that the stresses in some films are compressive stresses and the others are tension stresses. The experiments reveal that the heat treatment can effectively reduce the optical absorption and change the stress.

引用

页码：13 / 15

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