Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography

被引：0
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作者：
Seo, Eunsung [1 ]
Kim, Ohyun [1 ]
机构：
[1] POSTECH, Pohang, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 2000年 / 39卷 / 12期
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摘要：
10
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页码：6827 / 6830
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