Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

被引：0
|
作者：
Lee, Jaekul [1 ]
Shin, Hyunjung [2 ]
Kim, Sungdong [3 ]
Hong, Seungbum [3 ]
Chung, Juhwan [3 ]
Park, Hongsik [3 ]
Moon, Jooho [1 ]
机构：
[1] Department of Ceramic Engineering, Yonsei University, Seoul 120-749, Korea, Republic of
[2] Sch. of Adv. Materials Engineering, Kookmin University, Seoul 136-702, Korea, Republic of
[3] Samsung Adv. Inst. of Technology, P.O. Box 111, Suwon 440-600, Korea, Republic of
来源：
| 2003年 / Japan Society of Applied Physics卷 / 42期
关键词：
Microfabrication process - Spring constant;
D O I：
10.1143/jjap.42.l1171
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist
    Lee, J
    Shin, H
    Kim, S
    Hong, S
    Chung, J
    Park, H
    Moon, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2003, 42 (10A): : L1171 - L1174
  • [2] Fabrication of the Superhydrophobic Surface Using SU-8 Photoresist with Black Silicon
    Lee, Sang Eon
    Lee, Dongjin
    Kim, Jin-Ha
    Lee, Kang Won
    Lee, Kwang-Cheol
    Hong, Seong Uk
    Lee, Seung S.
    PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION, 2011, VOL 11, 2012, : 407 - 410
  • [3] Three-dimension photonic crystals fabrication using SU-8 photoresist
    Zhang, Xiao-Yu
    Gao, Hong-Tao
    Zhou, Chong-Xi
    Liu, Qiang
    Xing, Ting-Wen
    Yao, Han-Min
    Guangdian Gongcheng/Opto-Electronic Engineering, 2007, 34 (08): : 28 - 31
  • [4] Study of SU-8 photoresist cross-linking process by atomic force acoustic microscopy
    Zhao, Y.
    Liu, Y.
    Wang, Z.
    Wang, L.
    Li, L.
    Hou, F.
    Song, Z.
    Weng, Z.
    JOURNAL OF MICROSCOPY, 2019, 276 (03) : 136 - 144
  • [5] Fabrication of inkjet-printed SU-8 photoresist microlenses using hydrophilic confinement
    Chen, Wei-Chih
    Wu, Tsung-Ju
    Wu, Wen-Jong
    Su, Guo-Dung J.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2013, 23 (06)
  • [6] Fabrication and tests of a three-dimensional microsupercapacitor using SU-8 photoresist as the separator
    Xing, Hexin
    Wang, Xiaohong
    Shen, Caiwei
    Li, Siwei
    MICRO & NANO LETTERS, 2012, 7 (12) : 1166 - 1169
  • [7] Delamination analysis of low-temperature processed SU-8 photoresist for MEMS device fabrication
    Kim, GwangBeom
    Park, Chongdae
    Seo, Dong Sun
    Hong, Sang Jeen
    MECHANICAL BEHAVIOR OF MATERIALS X, PTS 1AND 2, 2007, 345-346 : 1397 - +
  • [8] Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching
    Pang, L
    Nakagawa, W
    Fainman, Y
    OPTICAL ENGINEERING, 2003, 42 (10) : 2912 - 2917
  • [9] Indirect removal of SU-8 photoresist using PDMS technique
    Li, JH
    Chen, D
    Zhang, JY
    Liu, JQ
    Zhu, J
    SENSORS AND ACTUATORS A-PHYSICAL, 2006, 125 (02) : 586 - 589
  • [10] Fabrication of an array of microcavities utilizing SU-8 photoresist as an alternative `LIGA' technology
    Roberts, Kevin
    Williamson, Fred
    Cibuzar, Greg
    Thomas, Lowell
    Biennial University/Government/Industry Microelectronics Symposium - Proceedings, 1999, : 139 - 141
12345