Fast-switching electrochromic smart windows based on WO3 doped NiO thin films

Nickel oxide (NiO) is a very promising material for the counter electrode in electrochromic devices (ECDs). In the current research, WO3 incorporated NiO thin films were fabricated via RF sputtering to enhance the electrochromic performance of NiO thin films. An XRD analysis revealed that the addition of WO3 to the cubic NiO thin film disrupts its long-range crystalline structure, resulting in an amorphous state. FESEM revealed the formation of columnar structure which favours ECDs. XPS analysis revealed that the addition of WO3 into NiO enhanced the hole concentration by creating nickel vacancies (nickel defects). Compared to pristine NiO, WO3 mixed NiO thin films showed enhanced optical modulation (66 %) with rapid switching speed (0.6 s/1.0 s for bleaching/colouring). This is mainly because the defect- induced amorphous structure of the nickel tungsten oxide thin film can provide large number of diffusion channels which facilitates the rapid ion intercalation process, and can accommodate large number of ions, and hence enhances the electrochromic performance. This advancement might have a substantial impact on the development of nickel tungsten oxide as a potential counter electrode in high-performance energy saving smart windows.