The influence of CH4/N2 Gas ratio on the structure and chemical composition of Cr(C, N) coatings deposited by CAD technology

被引：0

作者：

Kejzlar P. ^{[1
]}

Bakalova T. ^{[1
]}

Petkov N. ^{[2
]}

Bahchedzhiev H. ^{[2
]}

机构：

[1] Faculty of Mechanical Engineering, Department of Material Science, Technical University of Liberec, Studentska 2, Liberec

[2] Central Laboratory of Applied Physics, Bulgarian Academy of Sciences, 61, St. Peterburg Blvd., Plovdiv

来源：

| 2018年 / Jan-Evangelista-Purkyne-University卷 / 18期

关键词：

CAD technology; Cr(C; N); coatings; Roughness; Surface morphology;

D O I：

10.21062/ujep/201.2018/a/1213-2489/mt/18/6/917

中图分类号：

学科分类号：

摘要：

This article presents the study of the influence of the bias voltage and CH4/N2 gas ratio on the structure and chemical composition of Cr(C,N) coatings. The coatings were deposited by cathodic arc evaporation of pure Cr (99.99 %) cathode under an atmosphere of a mixture of CH4 and N2 gasses at the low deposition temperature of 300 °C. The ratio of reactive gasses was changed from 0 to 100 %. Energy-dispersive spectroscopy showed a linear dependence of resulting C/N ratio on the process gas ratio. The roughness of layers prepared from a mixture of process gasses is higher compared to pure gasses. © 2018. Published by Manufacturing Technology.

引用

页码：917 / 922

页数：5

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