Impact of evaporation characteristics of SiO2 on uniformity of thin-film thickness

被引：1

作者：

Wang N. ^{[1
,2
]}

Shao J. ^{[1
]}

Yi K. ^{[1
]}

Wei C. ^{[1
]}

机构：

[1] Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences

[2] Graduate University of Chinese Academy of Sciences

来源：

Zhongguo Jiguang/Chinese Journal of Lasers | 2010年 / 37卷 / 08期

关键词：

Evaporation characteristics; Evaporation material of SiO[!sub]2[!/sub; Heat distribution; Production of optic thin film; Thin films;

D O I：

10.3788/CJL20103708.2051

中图分类号：

学科分类号：

摘要：

Uniformity of thin-film thickness is one of the main standards of judging optical thin film. The bad uniformity of thin film can damage the characteristics of costing system. As a main material of low refractive index to preparation of optic thin film, SiO2 is poor thermal conductivity and sublimes. The particularity of evaporation characteristic of SiO2 leads to obvious change of thin film thickness when SiO2 is evaporated by e-beam method, which affects the quality of thin film heavily. For the purpose of analyzing the impacts of evaporation characteristics of SiO2 on uniformity of thin film thickness, the heat distribution of e-beam spot is calculated and simulated, and the mass distribution is calculated. According to the mass distribution and the change of evaporation angle of point on evaporation surface, the thin film thickness distribution on spherical surface and flat surface is calculated. The reason of making the impact of evaporation characteristics of SiO2 on uniformity of thin film thickness, and the particularity of thin film thickness distribution are concluded, which offer references of adjusting and improving the technological parameters for thin film coating of SiO2 material.

引用

页码：2051 / 2056

页数：5

共 10 条

[1] Fang M., Shao S., Shen X., Et al., Evolution of growth stress of HfO<sub>2</sub> thin film, Acta Optica Sinica, 29, 6, (2009)
[2] Tian X., Liu J., Li L., Et al., Thin films thickness calculation of vanadium dioxide using as laser protection material, Chinese J. Lasers, 35, s1, (2008)
[3] Wang S., Fang M., Yi K., Et al., Rate control in electron-beam evaporated optical coatings, Chinese J. Lasers, 35, 10, (2008)
[4] Wang S., Guo S., Yi K., The equipment of controlling deposition rate of e-beam evaporation and the control mathod: China
[5] Zhou J., Guo S., Yi K., Computer controlled equipment of e-beam deflection: China
[6] Ohring M., Materials Science of Thin Films: Deposition and Structure, (2002)
[7] Powell A., Pal U., van den Avyle J., Et al., Analysis of multicomponent evaporation in electron beam melting and refining of titanium alloys, Metallurgical and Materials Transactions B, 28, 6, (1997)
[8] Powell A., Minson P., Trapaga G., Et al., Mathematical modeling of vapor-plume focusing in electron-beam evaporation, Metallurgical and Materials Transactions A, 32, 8, (2001)
[9] Tang J., Gu P., Liu X., Et al., Modern Optical Thin Film Technology, (2006)
[10] Mattox D.M., Handbook of Physical Vapor Deposition (PVD) Processing, (1998)

← 1 →