Sensitivity analysis of scanning microwave microscopy for nano-scale dopant measurements in Si

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作者：
Torigoe, Kazuhisa [1 ,2 ]
Arita, Makoto [1 ]
Motooka, Teruaki [1 ]
机构：
[1] Department of Materials Science and Engineering, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan
[2] Technology Division, SUMCO Corp., Imari 849-4256, Japan
来源：
Journal of Applied Physics | 2012年 / 112卷 / 10期
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