Thermal mapping speeds DUV resist evaluation

被引:0
|
作者
Sharkey, Leo [1 ]
LeBlanc, Sean [1 ]
Keledjian, Steve [1 ]
机构
[1] Shipley Co, Marlborough, United States
关键词
D O I
暂无
中图分类号
学科分类号
摘要
7
引用
收藏
相关论文
共 50 条
  • [1] Resist pattern peeling assessment in DUV chemically amplified resist
    Mehta, SS
    Qin, SH
    Mukherjee-Roy, M
    Singh, N
    Kumar, R
    MICROELECTRONICS JOURNAL, 2004, 35 (05) : 427 - 429
  • [2] Optimizing a DUV positive resist for metal layers
    Malik, S
    Maxwell, B
    Gandolfi, A
    Ornaghi, A
    Whewell, A
    Uhnak, K
    Volpi, S
    Van Driessche, V
    Sarubbi, T
    Hansen, S
    Bowden, M
    MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 527 - 535
  • [3] Investigating positive DUV resist profile on TiN
    He, QZ
    Krisa, WL
    Lee, WW
    Hsu, WY
    Yang, H
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 : 988 - 996
  • [4] DUV resist strategy for applications of next generation devices
    Arai, Y
    Sato, K
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 : 300 - 313
  • [5] Effects of DUV resist sensitivities on lithographic process window
    Kemp, K
    Williams, D
    Cayton, J
    Steege, P
    Slonaker, S
    Elliott, R
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 : 955 - 962
  • [6] Effect of PEB exhaust on resist CD for DUV process
    Tsai, SF
    Chiu, YS
    Chien, CH
    Gao, HY
    Ku, CY
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2, 2004, 5376 : 1157 - 1164
  • [7] Evaluation of negative DUV resist UVN30 for electron beam exposure of NGL masks
    Masnyj, Z
    Mangat, P
    Ainley, E
    Nordquist, K
    Resnick, D
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 525 - 529
  • [8] Evaluation of DUV positive resist SHIPLEY XP9493 for E-beam lithography
    Tomalak, E
    MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 321 - 325
  • [9] Effects of DUV resist sensitivities on lithographic process window
    Kemp, K
    Williams, D
    Cayton, J
    Steege, P
    Slonaker, S
    Elliott, R
    MICROLITHOGRAPHIC TECHNIQUES IN IC FABRICATION, 1997, 3183 : 49 - 56
  • [10] The frog prince - A brief review of DUV resist technology
    Lee, DK
    Pawlowski, G
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (03) : 427 - 434