Influences of deposition pressure on structures and optical properties of sputtered aluminum nitride films

被引：0
|
作者：
Huang M. [1 ]
Du S. [1 ]
Wang L. [1 ]
Zhang L. [1 ]
机构：
[1] College of Physics and Electronic Information, Tianjin Normal University
来源：
Zhongguo Jiguang/Chinese Journal of Lasers | 2011年 / 38卷 / SUPPL. 1期
关键词：
AlN film; Deposition pressure; Reactive magnetron sputtering; Thin films; Transmittance spectrum;
D O I：
10.3788/CJL201138.s107003
中图分类号：
学科分类号：
摘要：
Aluminum nitride (AlN) films are fabricated on well polished K9 glass substrate by reactive radio frequency (RF) magnetron sputtering technique. Influence of deposition pressure on microstructure and properties of AlN films is investigated, as other deposition parameters are kept as constants. Experiments as well as simulation are carried out to investigate microstructures and optical properties of the films in terms of deposition pressure. The results indicate that the AlN films are crystalline and the deposition pressure influences orientation of the crystallites. The films are transparent according to the transmittance spectra. The refractive index, obtained by simulation of the transmittance spectra using envelope method, and the deposition rate of the films decreases with increasing deposition pressure. The mechanism of effects of deposition pressure on structure and optical properties of AlN films is tentatively analyzed.
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页码：s107003 / 1
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