Raman spectroscopy analysis of excimer laser crystallized amorphous silicon films

被引：0
|
作者：
Dai, Y.B. [1 ]
Shen, H.S. [1 ]
Zhang, Z.M. [1 ]
Zhang, S.Q. [1 ]
Xu, Z.Y. [1 ]
Li, X.J. [1 ]
机构：
[1] Inst. of Microelectron. Technol., Shanghai Jiaotong Univ., Shanghai 200030, China
来源：
Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University | 2001年 / 35卷 / 06期
关键词：
Amorphous silicon film;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：947 / 950
相关论文
共 50 条
  • [31] Recrystallization mechanism of amorphous silicon thin films upon excimer laser crystallization
    Kuo, Chil-Chyuan
    Yeh, Wen-Chang
    Hsiao, Chih-Ping
    Jeng, Jeng-Ywan
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2007, 1 (01): : 25 - 30
  • [32] Excimer laser microstructuring of amorphous silicon films for electron field emission applications
    Fan, Y.
    Rose, M. J.
    Persheyev, S. K.
    Shaikh, M. Z.
    2009 SYMPOSIUM ON PHOTONICS AND OPTOELECTRONICS (SOPO 2009), 2009, : 150 - 153
  • [33] Formation of Si nanoclusters in amorphous silicon thin films by excimer laser annealing
    Yeh, JL
    Chen, HL
    Shih, A
    Lee, SC
    ELECTRONICS LETTERS, 1999, 35 (23) : 2058 - 2059
  • [34] Selective area excimer-laser crystallization of amorphous silicon thin films
    Viatella, J
    Lee, SM
    Singh, RK
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (12) : 4605 - 4610
  • [35] Excimer laser crystallized phosphorous-doped polycrystalline silicon
    Saleh, R
    Nickel, NH
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 : 143 - 146
  • [36] Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel
    Nguyen, Thanh Nga
    Nguyen, Van Duy
    Jung, Sungwook
    Yi, Junsin
    APPLIED SURFACE SCIENCE, 2009, 255 (19) : 8252 - 8256
  • [37] Crystallization of amorphous silicon using an excimer laser
    Pribat, D
    Legagneux, P
    Plais, F
    Petinot, F
    Huet, O
    Reita, C
    ANNALES DE PHYSIQUE, 1997, 22 : 213 - 224
  • [38] Effects of strain on crystallization of amorphous silicon characterized by laser Raman spectroscopy
    Kimura, Y
    Katoda, T
    APPLIED SURFACE SCIENCE, 1997, 117 : 790 - 793
  • [39] Observation of defects in laser-crystallized polysilicon thin films by hydrogenation and raman spectroscopy
    Kitahara, Kuninori
    Nakajima, Kazuo
    Moritani, Akihiro
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (3 A): : 1209 - 1213
  • [40] Observation of defects in laser-crystallized polysilicon thin films by hydrogenation and Raman spectroscopy
    Kitahara, K
    Nakajima, K
    Moritani, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (3A): : 1209 - 1213
12345