Preparation of silicon-on-insulator wafer using spin etching and a subsequent selective etching process

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作者：
Lee, Seong-Eun [1 ]
Oh, Seung-Jin [1 ]
So, Sang-Mun [1 ]
Kim, Heon-Do [1 ]
Chung, Sung-Woong [1 ]
Sohn, Hyun-Chul [1 ]
机构：
[1] Advanced Process Team, Memory R and D Division, Hynix Semiconductor Co., Ltd., San 136-1, Ami-Ri, Bubal-Eub, Ichon-Si, Kyoungki-Do 467-701, Korea, Republic of
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| 1600年 / Japan Society of Applied Physics卷 / 41期
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