Polymerization Kinetics and Phase Separation for Polysilane Block Copolymers

被引：0
|
作者：
He L. [1 ,2 ,3 ]
Huang Q. [1 ]
Zhu X. [1 ,2 ]
Hong K. [1 ,2 ]
Yun S. [1 ,2 ]
Zhang J. [1 ,2 ]
机构：
[1] Faculty of Chemical Engineering, Huaiyin Institute of Technology, Huai'an
[2] Jiangsu Provincial Engineering Laboratory for Advanced Materials of Salt Chemical Industry, Huai'an
[3] Wanbang Perfume Industrial Limited Company, Huai'an
来源：
He, Lei (heleihuaiying@163.com) | 2018年 / Sichuan University卷 / 34期
关键词：
Phase separation; Polymerization kinetics; Polysilane block copolymer; Rate constants;
D O I：
10.16865/j.cnki.1000-7555.2018.06.004
中图分类号：
学科分类号：
摘要：
Polysilane based block copolymers were prepared by photopolymerization using poly(methylphenylsilane) (PMPS) as photo-radical initiator. Effects of monomer type, UV intensity and PMPS/monomers mass ratio on polymerization kinetics parameters and block length were evaluated by the self-build kinetic modeling. These results were analyzed together with the phase separation observations. Since the average number of carbon atoms per structural block decreases to 5~6 and the average number of silicon atoms per structural block decreases to about 2 after 1000 s of polymerization, no phase separation occurs. The results indicate that they are potential materials for optical waveguide applications. © 2018, Editorial Board of Polymer Materials Science & Engineering. All right reserved.
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页码：22 / 26and35
页数：2613
相关论文
共 11 条
  • [1] Kitao T., Bracco S., Comotti A., Et al., Confinement of single polysilane chains in coordination nanospaces, J. Am. Chem. Soc., 137, pp. 5231-5238, (2015)
  • [2] Song L.Y., Ye Q., Ge X.P., Et al., Tris(trimethylsilyl)silane as a co- initiator for dental adhesive: Photo-polymerization kinetics and dynamic mechanical property, Dent. Mater., 32, pp. 102-113, (2016)
  • [3] Liang Q.H., Zhang L.P., Xiong Y., Et al., A facile method to prepare a polyethylene glycol modified polysilane as a waterborne photoinitiator, J. Photochem. Photobiol., A, 299, pp. 9-17, (2015)
  • [4] Miller R.D., Michl J., Polysilane high polymers, Chem. Rev., 89, pp. 1359-1410, (1989)
  • [5] Chen H.B., Chang T.C., Chiu Y.S., Et al., Photopolymerization of styrene, p-chlorostyrene, methyl methacrylate, and butyl methacrylate with polymethylphenylsilane as photoinitiator, Polym. Chem., 34, pp. 679-685, (1996)
  • [6] Peinado C., Alonso A., Catalina F., Et al., Free radical photopolymerization initiated by polysilanes. Scrutiny of the Initiation efficiency, Macromol. Chem. Phys., 201, pp. 1156-1160, (2000)
  • [7] He L., Chen B.X., Iso M., Comparative study of photobleachable polysilane copolymers applied to optical waveguides, Opt. Mater., 33, pp. 452-459, (2011)
  • [8] He L., Tanaka R., Chen B., Et al., Kinetic modeling for photoinitiated block copolymerization of benzyl methacrylate with poly(methylphenylsilane), J. Chem. Eng. Jpn, 44, pp. 821-827, (2011)
  • [9] Alfrey J.T., Overberger C.G., Pinner S.H., Copolymerization behavior of ionizable monomers, J. Am. Chem. Soc., 75, pp. 4221-4223, (1953)
  • [10] McClellan A.L., Tables of Experimental Dipole Moments, pp. 1-21, (1963)
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