Thermal stability of Ni/Ti/Al ohmic contacts to p- type 4H-SiC

被引：0
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作者：
20150900589130
机构：
[1] Yu, Hailong
[2] Zhang, Xufang
[3] Shen, Huajun
[4] Tang, Yidan
[5] Bai, Yun
[6] Wu, Yudong
[7] Liu, Kean
[8] Liu, Xinyu
来源：
Shen, Huajun (shenhuajun@ime.ac.cn) | 1600年 / American Institute of Physics Inc.卷 / 117期
关键词：
Ohmic contacts;
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Journal article (JA)
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