Experimental study on main pulse power supply for discharge produced plasma extreme ultraviolet source

被引：0
|
作者：
Lü P. [1 ]
Liu C. [1 ]
Zhang C. [1 ]
Zhao Y. [2 ]
Wang Q. [2 ]
Jia X. [3 ]
机构：
[1] Electrical Engineering Department, Harbin Institute of Technology
[2] National Key Laboratory of Tunable Laser Technology, Harbin Institute of Technology
[3] Institute of Fluid Physics, CAEP
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2010年 / 22卷 / 02期
关键词：
Discharge produced plasma; Extreme ultraviolet source; Magnetic pulse compression; Main pulse; Z-pinch;
D O I：
10.3788/HPLPB20102202.0388
中图分类号：
学科分类号：
摘要：
Extreme ultraviolet lithography(EUVL) is regarded as one of the most promising next generation lithographies. Among all the EUVL system technologies, the extreme ultraviolet source is the key issue. Compared with other light sources, gas discharge-produced plasma extreme ultraviolet source has drawn much attention around the world for its advantages in many aspects. The main pulse power generator for the Z-pinch discharge produced plasma extreme ultraviolet source is described in this paper, the circuit topology is presented. The critical 3-stage magnetic pulse compression is emphasized, its parameters are presented in the paper. Moreover, a novel configuration of the final magnetic pulse compression unit is introduced. Experiment results show that each pulse compression effect meets the anticipated target, the peak value of the output voltage is 30 kV, the maximum output discharge current is 40 kA and the pulse width is 200 ns.
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页码：388 / 392
页数：4
相关论文
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