Removal of photoresist masks with the use of rapid heat treatment

被引：0
|
作者：
Pilipenko, V.A. [1 ]
Ponomar', V.N. [1 ]
Gorushko, V.A. [1 ]
机构：
[1] Integral, ul. Korzhenevskogo 12, Minsk, 220064, Belarus
来源：
Inzhenerno-Fizicheskii Zhurnal | 2003年 / 76卷 / 05期
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D O I：
10.1023/b:joep.0000003223.10856.31
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页码：107 / 109
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