Curie temperature and critical thickness of ferroelectric thin films

被引：0
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作者：
Wang, Biao [1 ,2 ]
Woo, C.H. [1 ]
机构：
[1] Department of Electronic and Information Engineering, Hong Kong Polytechnic University, Hung Hom, Hong Kong
[2] State Key Laboratory of Optoelectronic Materials and Technology, School of Physics and Engineering, Sun Yat-sen University, Guangzhou, China
来源：
| 1600年 / American Institute of Physics Inc.卷 / 97期
关键词：
Ferroelectric materials;
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