Structural colors resulting from the interference between incident light and structures are ubiquitous in nature and daily life. In contrast to conventional chemical pigments and dyes, structural colors have the advantages of low loss, environmental protection and high durability,and have broad application prospects in the fields of display, optical storage, sensing and information encryption. In recent years, with the continuous development of micro-nano processing technology and characterization methods, the use of artificially manufactured metallic nanostructures has become the main method to produce structural colors. However, inevitable high loss of resonant plasmonic structural colors will lead to reduced scattering cross-sections, so it causes a series of problems like limited hue range, reduced color saturation and low value. Compared with the plasmonic structure, resonant dielectric and hybrid structures are subjected to low loss while providing strong field confinement and large scattering cross sections. Therefore, the research of dielectric structural color is of great significance to achieve bright structural colors in ultra-high resolution. In this paper, we first introduce some theoretical foundations of dielectric structure colors, and then review the latest research progress according to the types of dielectric: silicon, silicon dioxide, titanium dioxide, silicon nitride and other materials. Finally, we put forward our own opinion on the possible future development direction and existing challenges of the rapid developing field of the dielectric structure colors. © 2022 Cailiao Daobaoshe/ Materials Review. All rights reserved.
