Studies on ultrathin silicon oxide films and their current problems

被引：0
|
作者：
Hattori, T. [1 ]
机构：
[1] Dept. of Elec. and Electronic Eng., Faculty of Engineering, Musashi Institute of Technology, 1-28-1 Tamazutsumi, Setagaya-ku, 158-8557 Tokyo, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 2001年 / 44卷 / 08期
关键词：
All Open Access; Bronze;
D O I：
10.3131/jvsj.44.695
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：695 / 700
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