Photoluminescence analysis of plasma-deposited oxygen-rich silicon oxynitride films

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[1] [1,Noma, Takashi
[2] Seol, Kwang Soo
[3] Fujimaki, Makoto
[4] Kato, Hiromitsu
[5] Watanabe, Takashi
[6] Ohki, Yoshimichi
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Noma, Takashi | 2000年 / JJAP, Tokyo, Japan卷 / 39期
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