Patterned magnetic permalloy and nickel films: Fabrication by electron beam and X-ray lithographic techniques

被引：0

作者：

Candeloro, Patrizio ^{[1
]}

Gerardino, Annamaria ^{[1
,4
]}

Di Fabrizio, Enzo ^{[2
]}

Cabrini, Stefano ^{[1
]}

Giannini, Giorgio ^{[2
]}

Mastrogiacomo, Luigi ^{[1
]}

Ciria, Miguel ^{[2
]}

O'Handley, Robert C. ^{[3
]}

Gubbiotti, Gianluca ^{[2
]}

Carlotti, Giovanni ^{[1
]}

机构：

[1] CNR-IESS, Istituto di Elettronica Dello Stato Solido, Via Cineto Romano, 4200156 Roma, Italy

[2] TASC-INFM, Area della Ricerca, Basovizza, 43100 Trieste, Italy

[3] INFM, Dipartimento di Fisica, Università di Perugia, Via A. Pascoli, 06100 Perugia, Italy

[4] Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, United States

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 08期

关键词：

Brillouin scattering - Electron beam lithography - Magnetometers - Magnetooptical effects;

D O I：

10.1143/jjap.41.5149

中图分类号：

学科分类号：

摘要：

Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 × 1) mm2. Dot dimensions and spacings range from 500 nm to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

引用

页码：5149 / 5152

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