Prepartion of tunable bandgap silicon films by reactive magnetron sputtering

被引：0
|
作者：
Yang, Suolong [1 ]
Liu, Yi [1 ]
Luo, Lizhu [1 ]
Jiang, Chunli [1 ]
Xu, Qinying [1 ]
Wang, Xiaoying [1 ]
Liu, Yonggang [2 ]
机构：
[1] Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang,621907, China
[2] Southwest University of Science and Technology, Mianyang,621900, China
来源：
Taiyangneng Xuebao/Acta Energiae Solaris Sinica | 2014年 / 35卷 / 09期
关键词：
Energy gap;
D O I：
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摘要：
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页码：1568 / 1573
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