Modelling of the flow in the vertical MOCVD reactor

被引：0
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作者：
Grygoriev, Anatolij [1 ]
Jezowiecka-Kabsch, Krystyna [1 ]
Szewczyk, Henryk [1 ]
机构：
[1] Politechnika Wroclawska, ITCMP, Wroclaw, Poland
来源：
Inzynieria Chemiczna i Procesowa | 2002年 / 22卷 / 03期
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摘要：
Chemical reactors
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页码：505 / 525
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