Growth of β-Ga2O3 Thin Films on Ga2O3/GaN/Sapphire Template

被引:0
|
作者
Jiao T. [1 ]
Li Z.-M. [1 ]
Wang Q. [2 ]
Dong X. [1 ]
Zhang Y.-T. [1 ]
Bai S. [2 ]
Zhang B.-L. [1 ]
Du G.-T. [1 ]
机构
[1] State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun
[2] State Key Laboratory of Wide-bandgap Semiconductor Power Electronic Devices, Nanjing Electronic Devices Institute, Nanjing
来源
基金
中国国家自然科学基金;
关键词
Gallium oxide; High temperature oxidation; Metal-organic chemical vapor deposition;
D O I
10.3788/fgxb20204103.0281
中图分类号
学科分类号
摘要
To obtain high-quality β-Ga2O3 thin film, GaN thin film grown on c-plane sapphire is made into Ga2O3/GaN/sapphire template by thermal oxidation, and the β-Ga2O3 thin film is grown on the template by metal-organic chemical vapor deposition(MOCVD). The crystal structure and surface morphology of the samples are measured and analyzed by X-ray diffraction, atomic force microscope and field emission scanning electron microscope. The results show that the crystal quality of the β-Ga2O3 films is affected by GaN film oxidation effect and MOCVD process conditions greatly. By optimizing the experimental conditions, the high-quality β-Ga2O3 thin films are obtained. By comparing with the films grown on sapphire or GaN films, the crystal quality of the β-Ga2O3 films is found improved obviously. We find that this method successfully transforms the heteroepitaxy of the β-Ga2O3 film on sapphire substrate or GaN/sapphire template into the homoepitaxy of that on Ga2O3/GaN/sapphire template, effectively reduces the large lattice mismatch and thermal mismatch between β-Ga2O3 film, sapphire and GaN, and is beneficial to improve the crystal quality of β-Ga2O3 film. © 2020, Science Press. All right reserved.
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页码:281 / 287
页数:6
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