Recurrent Neural-Network-Based Model Predictive Control of a Plasma Etch Process

被引：0
|
作者：
Xiao, Tianqi [1 ]
Wu, Zhe [2 ]
Christofides, Panagiotis D. [3 ,4 ]
Armaou, Antonios [5 ,6 ,7 ]
Ni, Dong [1 ]
机构：
[1] College of Control Science and Engineering, Zhejiang University, Hangzhou,310027, China
[2] Department of Chemical and Biomolecular Engineering, National University of Singapore, 117585, Singapore
[3] Department of Chemical and Biomolecular Engineering, University of California, Los Angeles,CA,90095-1592, United States
[4] Department of Electrical and Computer Engineering, University of California, Los Angeles,CA,90095-1592, United States
[5] Department of Chemical Engineering, The Pennsylvania State University, University Park,PA,16802, United States
[6] Department of Mechanical Engineering, The Pennsylvania State University, University Park,PA,16802, United States
[7] Department of Chemical Engineering, University of Patras, Patras,26243, Greece
来源：
Industrial and Engineering Chemistry Research | 2022年 / 61卷 / 01期
关键词：
The authors are grateful for the financial support from National Natural Science Foundation of China (grant no. U1609213);
D O I：
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学科分类号：
摘要：
61
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页码：638 / 652
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