PVD-Sputteranlagen im ständigen Wandel: Anforderungen und Lösungskonzepte für flexible Inline-Anlagen mittlerer Substratgrößen

被引：0

作者：

Seyfert U. ^{[1
]}

Heydenreich U. ^{[1
]}

机构：

[1] VON ARDENNE GmbH, Am Hahnweg 8, Dresden

来源：

Vakuum in Forschung und Praxis | 2020年 / 32卷 / 03期

关键词：

D O I：

10.1002/vipr.202000739

中图分类号：

学科分类号：

摘要：

PVD sputter systems in continuous evolution. Due to the large number of process variations and usable layer materials and their combinations, magnetron sputtering offers a wide range of applications in the industry. The automotive industry, with its focus on electromobility is currently a strong driver for new applications. Increasing technical requirements and the rising cost pressure must be translated into economically viable system concepts. In this article, various basic deposition principles of deposition in inline and batch coaters for magnetron sputtering are explained. Furthermore, some applications and their requirements are described, and a concept derived from this for an inline magnetron sputtering system is presented. © 2020, Wiley-VCH Verlag. All rights reserved.

引用

页码：16 / 24

页数：8