Low-energy modeling of three-dimensional topological insulator nanostructures

被引:1
|
作者
Zsurka, Eduard [1 ,2 ,3 ,4 ]
Wang, Cheng [5 ,6 ]
Legendre, Julian [4 ]
Di Miceli, Daniele [4 ,7 ]
Serra, Llorenc [7 ,8 ]
Gruetzmacher, Detlev [1 ,2 ,3 ]
Schmidt, Thomas L. [4 ]
Ruessmann, Philipp [5 ,6 ,9 ]
Moors, Kristof [1 ,2 ,3 ]
机构
[1] Forschungszentrum Julich, Peter Grunberg Inst PGI 9, D-52425 Julich, Germany
[2] Forschungszentrum Julich, JARA Fundamentals Future Informat Technol, Julich Aachen Res Alliance, Aachen, Germany
[3] Rhein Westfal TH Aachen, D-52425 Aachen, Germany
[4] Univ Luxembourg, Dept Phys & Mat Sci, L-1511 Luxembourg, Luxembourg
[5] Forschungszentrum Julich, Peter Grunberg Inst PGI 1, D-52425 Julich, Germany
[6] JARA, D-52425 Julich, Germany
[7] Inst Cross Disciplinary Phys & Complex Syst IFISC, E-07122 Palma De Mallorca, Spain
[8] Univ Illes Balears, Dept Phys, E-07122 Palma De Mallorca, Spain
[9] Univ Wurzburg, Inst Theoret Phys & Astrophys, D-97074 Wurzburg, Germany
来源
PHYSICAL REVIEW MATERIALS | 2024年 / 8卷 / 08期
关键词
SHAPE-TRUNCATION FUNCTIONS; SURFACE; BI2SE3; STATES;
D O I
10.1103/PhysRevMaterials.8.084204
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We develop an accurate nanoelectronic modeling approach for realistic three-dimensional topological insulator nanostructures and investigate their low-energy surface-state spectrum. Starting from the commonly considered four-band k <middle dot> p bulk model Hamiltonian for the Bi2Se3 family of topological insulators, we derive new parameter sets for Bi2Se3, Bi2Te3, and Sb2Te3. We consider a fitting strategy applied to ab initio band structures around the F point that ensures a quantitatively accurate description of the low-energy bulk and surface states while avoiding the appearance of unphysical low-energy states at higher momenta, something that is not guaranteed by the commonly considered perturbative approach. We analyze the effects that arise in the low-energy spectrum of topological surface states due to band anisotropy and electron-hole asymmetry, yielding Dirac surface states that naturally localize on different side facets. In the thin-film limit, when surface states hybridize through the bulk, we resort to a thin-film model and derive thickness-dependent model parameters from ab initio calculations that show good agreement with experimentally resolved band structures, unlike the bulk model that neglects relevant many-body effects in this regime. Our versatile modeling approach offers a reliable starting point for accurate simulations of realistic topological material-based nanoelectronic devices.
引用
收藏
页数:11
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