Low dielectric polyimide microsphere/polyimide composite films based on porous polyimide microsphere

A low dielectric polyimide/polyimide microsphere (PI/PM) composite film was constructed by thermal imidization of polyamic acid from pyromellitic dianhydride (PMDA) and 4,4 '-oxydianiline (ODA) in the presence of porous PM. The PM particles with particle size of about 2 mu m were prepared via the solvothermal method using 3,3 ',4,4 '-benzophenonetetracarboxylic dianhydride (BTDA) and ODA as monomers through thermal imidization. Due to the favorable compatibility between the porous PM and PI matrix, the mechanical properties, thermal stability, and dielectric properties of the obtained composite films were significantly improved. The PI/PM composite films had a tensile strength of 44.18-64.32 MPa, and the corresponding elongation at break of 6.21%-11.7%. Furthermore, the thermogravimetric temperatures of T5% were 538.9-563.7 degrees C. The dielectric constants of the composite films at 1 MHz were 2.59-3.68, and the corresponding dielectric loss were only 0.0119-0.00405. Thus, the combination of excellent mechanical properties, high thermal stability, extremely low dielectric constant, and dielectric loss make the composite films ideal for deployment as high-performance materials for 5G applications.Highlights Low dielectric polyimide composite film was prepared by thermal imidization of polyamic acid in the presence of porous polyimide microspheres. Porous polyimide microspheres were prepared by thermal using the imidization solvothermal method. Low dielectric polyimide composite film with good comprehensive properties. Low dielectric polyimide microsphere/polyimide composite films composite film with good comprehensive properties was prepared by thermal imidization of polyamic acid in the presence of porous polyimide microspheres. image