Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: Combining experiments and theoretical calculation

被引:1
|
作者
Li, Xinjie [1 ,2 ,4 ]
Zou, Yida [1 ,2 ,4 ]
Niu, Xinhuan [1 ,2 ,4 ]
Jia, Yingqian [3 ,4 ]
Zhan, Ni [1 ,2 ,4 ]
Liu, Jianghao [1 ,2 ,4 ]
He, Chao [1 ,2 ,4 ]
Dong, Changxin [1 ,2 ,4 ]
Shi, Yunhui [1 ,2 ,4 ]
机构
[1] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin 300130, Peoples R China
[2] Hebei Collaborat Innovat Ctr Microelect Mat & Tech, Tianjin 300130, Peoples R China
[3] Shijiazhuang Univ, Coll Phys & Elect Informat Engn, Shijiazhuang 050031, Peoples R China
[4] Hebei Engn Res Ctr Microelect Mat & Devices, Tianjin 300130, Peoples R China
基金
中国国家自然科学基金;
关键词
Sapphire; Chemical mechanical polishing (CMP); Complexing agents; Chemical and mechanical action; Theoretical calculation; ABRASIVES; REMOVAL; CMP; PARAMETERS; ALUMINUM; BEHAVIOR;
D O I
10.1016/j.triboint.2024.110042
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
High efficiency and environmentally friendly is the core development in sapphire chemical mechanical polishing (CMP) slurry. Therefore, complexing agents xylitol (XL) and mannitol (MA) were used to enhance the CMP performance of sapphire. The results showed that the addition of 0.2 wt% MA resulted in the optimal MRRs of C-, A- and R-plane sapphire, which are 4.878 mu m/h, 2.242 mu m/h and 2.731 mu m/h, and the surface roughness is 0.274 nm, 0.262 nm and 0.260 nm, respectively. Partical size detection, XPS, FTIR and density functional theory (DFT) calculations results showed that the addition of MA did not alter the mechanical action, but can react with Al (OH)(4)(-) to form softer complexes, which improves MRRs and surface quality.
引用
收藏
页数:11
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