Self-Selective Crossbar Synapse Array with n-ZnO/p-NiOx/n-ZnO Structure for Neuromorphic Computing
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作者:
Chung, Peter Hayoung
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Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Chung, Peter Hayoung
[1
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Ryu, Jiyeon
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Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Ryu, Jiyeon
[1
]
Seo, Daejae
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Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Seo, Daejae
[1
]
Sahu, Dwipak Prasad
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Univ Utah, Dept Mech Engn, 1495 E 100 S, Salt Lake City, UT 84112 USAUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Sahu, Dwipak Prasad
[2
]
Song, Minju
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Ulsan Natl Inst Sci & Technol, Dept Mat Sci & Engn, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Song, Minju
[3
]
Kim, Junghwan
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Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol, Dept Mat Sci & Engn, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Kim, Junghwan
[1
,3
]
Yoon, Tae-Sik
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Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol, Dept Mat Sci & Engn, Ulsan 44919, South Korea
Ulsan Natl Inst Sci & Technol, Ctr Future Semicond Technol, Ulsan 44919, South KoreaUlsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
Yoon, Tae-Sik
[1
,3
,4
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机构:
[1] Ulsan Natl Inst Sci & Technol, Grad Sch Semicond Mat & Devices Engn, Ulsan 44919, South Korea
[2] Univ Utah, Dept Mech Engn, 1495 E 100 S, Salt Lake City, UT 84112 USA
[3] Ulsan Natl Inst Sci & Technol, Dept Mat Sci & Engn, Ulsan 44919, South Korea
[4] Ulsan Natl Inst Sci & Technol, Ctr Future Semicond Technol, Ulsan 44919, South Korea
Artificial synapse devices are essential elements for highly energy-efficient neuromorphic computing. They are implemented as crossbar array architecture, where highly selective synaptic weight updates for training and sneak leakage-free inference operations are required. In this study, self-selective bipolar artificial synapse device is proposed with n-ZnO/p-NiOx/n-ZnO heterojunction, and its analog synapse operation with high selectivity is demonstrated in 32 x 32 crossbar array architecture without the aid of selector devices. The built-in potential barrier at p-NiOx/n-ZnO junction and the Zener tunneling effect provided nonlinear current-voltage characteristics at both voltage polarities for self-selecting function for synaptic potentiation and depression operations. Voltage-driven redistribution of oxygen ions inside n-p-n oxide structure, evidenced by x-ray photoelectron spectroscopy, modulated the distribution of oxygen vacancies in the layers and consequent conductance in an analog manner for the synaptic weight update operation. It demonstrates that the proposed n-p-n oxide device is a promising artificial synapse device implementing self-selectivity and analog synaptic weight update in a crossbar array architecture for neuromorphic computing.
机构:
Alzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Alzahra Univ, Fac Phys & Chem, Dept Phys, Tehran 1993891167, IranAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Ghaderi, Atefeh
Shafiekhani, Azizollah
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Alzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, IranAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Shafiekhani, Azizollah
Talu, Stefan
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Tech Univ Cluj Napoca, Directorate Res Dev & Innovat Management DMCDI, Constantin Daicoviciu St 15, Cluj Napoca 400020, Cluj country, RomaniaAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Talu, Stefan
Dejam, Laya
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Islamic Azad Univ, Dept Phys, West Tehran Branch, Tehran, IranAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Dejam, Laya
Solaymani, Shahram
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Islamic Azad Univ, Quantum Technol Res Ctr QTRC, Sci & Res Branch, Tehran, IranAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Solaymani, Shahram
Morozov, Ilya A.
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RAS, UB, Inst Continuous Media Mech, 1 Korolev St, Perm 614013, RussiaAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Morozov, Ilya A.
Matos, Robert S.
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Univ Fed Amapa, Dept Phys, Amazonian Mat Grp, BR-68903419 Macapa, BrazilAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Matos, Robert S.
Ferreira, Nilson S.
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Univ Fed Sergipe, Dept Phys, BR-49100000 Sao Cristovao, BrazilAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
Ferreira, Nilson S.
Sari, Amir H.
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Islamic Azad Univ, Quantum Technol Res Ctr QTRC, Sci & Res Branch, Tehran, IranAlzahra Univ, Fac Phys, Dept Theo Phys & Nano, Tehran 1993891167, Iran
机构:
VIT Univ, Sch Adv Sci, Div Mat Phys, Vellore 632014, Tamil Nadu, IndiaVIT Univ, Sch Adv Sci, Div Mat Phys, Vellore 632014, Tamil Nadu, India
Balakrishnan, L.
Gowrishankar, S.
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Natl Inst Technol, Dept Phys, Thin Film Lab, Tiruchirappalli 620015, Tamil Nadu, IndiaVIT Univ, Sch Adv Sci, Div Mat Phys, Vellore 632014, Tamil Nadu, India
Gowrishankar, S.
Gopalakrishnan, N.
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Natl Inst Technol, Dept Phys, Thin Film Lab, Tiruchirappalli 620015, Tamil Nadu, IndiaVIT Univ, Sch Adv Sci, Div Mat Phys, Vellore 632014, Tamil Nadu, India
机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Sun, J. C.
Zhao, J. Z.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Zhao, J. Z.
Liang, H. W.
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Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R ChinaDalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Liang, H. W.
Bian, J. M.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Bian, J. M.
Hu, L. Z.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Hu, L. Z.
Zhang, H. Q.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Zhang, H. Q.
Liang, X. P.
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Liang, X. P.
Liu, W. F.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
Liu, W. F.
Du, G. T.
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机构:Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion Electron Be, Dalian 116024, Peoples R China
机构:
Jining Univ, Dept Phys, Qufu 273155, Peoples R China
Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China
Qi, H. X.
Li, Q. S.
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Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China
Li, Q. S.
Zhao, B.
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Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China
Zhao, B.
Zheng, M. M.
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机构:
Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China
Zheng, M. M.
Li, X. S.
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机构:
Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China
Li, X. S.
Zhang, N.
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Qufu Normal Univ, Dept Phys, Qufu 273165, Peoples R ChinaJining Univ, Dept Phys, Qufu 273155, Peoples R China