Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

被引：0

作者：

Cadieux, Nathalie ^{[1
]}

Camille, Audree Bethsa ^{[1
]}

Cadieux, Jean ^{[2
]}

Gouin, Marie-Michelle ^{[1
]}

Morin, Eveline ^{[1
]}

Fournier, Pierre-Luc ^{[2
]}

机构：

[1] Univ Sherbrooke, Dept Management & Human Resource Management, Sherbrooke, PQ J1K 2R1, Canada

[2] Univ Sherbrooke, Dept SIMQG, Sherbrooke, PQ J1K 2R1, Canada

来源：

COMPUTERS IN HUMAN BEHAVIOR REPORTS | 2024年 / 16卷

关键词：

Techno-stressors; Technostress; Techno-distress; Bilingual measurement scale; Second-order formative model; WORK-LIFE BALANCE; FIT INDEXES; DARK SIDE; IMPACT; COMMUNICATION; INDICATORS; CONSTRUCTS; SATISFACTION; OVERLOAD; CREATORS;

D O I：

10.1016/j.chbr.2024.100485

中图分类号：

B84 [心理学];

学科分类号：

04 ; 0402 ;

摘要：

Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n(1) = 544; ENG-n(2) = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process.

引用

页数：17