Guest Editorial Special Issue on Plasma-Assisted Technologies

被引：0
|
作者：
Matveev, Igor [1 ]
Gessini, Paolo [2 ]
机构：
[1] Appl Plasma Technol Corp, Marshall, VA 20115 USA
[2] Univ Brasilia, Aerosp Engn, BR-70610200 Brasilia, DF, Brazil
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2024年 / 52卷 / 04期
关键词：
D O I：
10.1109/TPS.2024.3393688
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
This is the seventeenth issue in a series of special issues on plasma-assisted technologies. Herein, the reader will find a broad variety of new and exciting applications and refinements of plasma-based systems. The broad scope of topics is a testament to the expansion and diversity of possible applications of plasmas and follows upon the great success of the 16 previous issues.
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页码：1145 / 1147
页数：3
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