In this manuscript we present the steps required to fabricate, modify, and measure a plasmonic metasurface array for cross-reactive sensing applications. Multiple arrays of gold nanostructures were fabricated using a standard top-down electron-beam lithography process and then enclosed in a microfluidic chamber. Partial-selectivity was then achieved by using different thiol chemistries to modify each array. Finally, measurements of various samples were taken using a custom-built microscope setup.
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Technion Israel Inst Technol, Lab Nanomat Based Devices, IL-32000 Haifa, IsraelTechnion Israel Inst Technol, Lab Nanomat Based Devices, IL-32000 Haifa, Israel
Tisch, Ulrike
Haick, Hossam
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Technion Israel Inst Technol, Lab Nanomat Based Devices, IL-32000 Haifa, Israel
Technion Israel Inst Technol, Dept Chem Engn, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, IsraelTechnion Israel Inst Technol, Lab Nanomat Based Devices, IL-32000 Haifa, Israel