Operando electrical biasing TEM experiments of Ge-rich GST thin films with FIB sample preparation

被引:0
|
作者
Zhang, Leifeng [1 ]
Park, Bumsu [1 ]
Chapuis, Lucas [1 ]
Gruel, Kilian [1 ]
Cours, Robin [1 ]
Lorut, Frederic [2 ]
Hytch, Martin [1 ]
Gatel, Christophe [1 ,3 ]
机构
[1] CNRS, CEMES, F-31055 Toulouse, France
[2] STMicroelectronics, F-38920 Crolles, France
[3] Univ Paul Sabatier, F-31062 Toulouse, France
基金
欧盟地平线“2020”;
关键词
GGST; PCM; Crystallization; Operando electrical biasing TEM; Phase change; PHASE-CHANGE CHARACTERISTICS; CARBON-DOPED GE2SB2TE5; MEMORY DEVICES; VOID FORMATION; NANOSCALE; CRYSTALLIZATION; PERFORMANCE; TRANSITION;
D O I
10.1016/j.jallcom.2024.175626
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ge-Sb-Te (GST) ternary alloy is the core material for phase-change memory (PCM). Compared with Ge2Sb2Te5 2 Sb 2 Te 5 (GST-225), Ge-rich GST (GGST) has a higher crystallization temperature (about 400 degrees C) degrees C) and thereby an improved thermal stability. In this paper, we propose a methodology dedicated to studying the phase changes by operando transmission electron microscopy (TEM). The methodology combines focused ion beam (FIB) specimen preparation and injection of electrical pulses for in-situ studies. We show how the microstructure is correlated to the electrical switching dynamics in GGST nanobridges. The electrical pulse modification, the electrochemical migration, local current density, void formation and the corresponding switching mechanism are discussed.
引用
收藏
页数:9
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