Fabrication of Three-Side-Around Control Gate of Semi-Floating Gate Transistor

被引:0
|
作者
Yang, Shiling [1 ]
Ma, Yanfei [1 ]
Zhang, Xueli [1 ]
Duan, Pengtao [1 ]
Guan, Tianpeng [1 ]
机构
[1] Shanghai Huali Integrated Circuit Corp, Shanghai 202310, Peoples R China
关键词
D O I
10.1109/CSTIC61820.2024.10531937
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
Semi-floating gate (SFG) transistor is a novel dynamic random access memory (DRAM), which uses an embedded tunneling field-effect (TFET) transistor for charging and discharging the semi-floating gate. The charging efficiency is constrained by the relatively small capacitance due to traditional limited coupling area between control gate and semi-floating gate. In this paper, we report a novel method to fabricate 3D semi-floating gate transistor with three-side-around control gate. Poly cut approach is applied to isolate semi-floating gate and offer additional area (similar to 66%) for coupling control gate. The increasing capacitance could trap more charges and lead to more obvious difference to the transistor threshold voltage (VT). With the same Read 0 current, the Read 1 current is 6.7 times higher than that of traditional semi-floating gate device. This design provides a technical scheme for further boosting semi-floating gate transistor.
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页数:2
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