Vapor-phase synthesis of MOF films

被引：0

作者：

Choe, Myeonggeun ^{[1
]}

Lee, Hyeonwoo ^{[1
]}

Choi, Hee Cheul ^{[1
]}

机构：

[1] Pohang POSTECH, Dept Chem, 77 Cheongam Ro, Pohang 37673, South Korea

来源：

BULLETIN OF THE KOREAN CHEMICAL SOCIETY | 2024年 / 45卷 / 07期

关键词：

chemical vapor deposition; film; metal-organic framework; molecular layer deposition; vapor-phase reaction; METAL-ORGANIC FRAMEWORKS; THIN-FILMS; LAYER DEPOSITION; POWDER SYNTHESIS; FABRICATION; CONVERSION; SILICON; GROWTH; ARRAYS; ROUTE;

D O I：

10.1002/bkcs.12854

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Fabrication of thin films is the most crucial step in introducing promising new materials into practical devices. Among the various materials, metal-organic framework (MOF) thin films have gained widespread attention with the advantage of diverse applications. In this review, two representative vapor-phase synthetic methods, (1) molecular layer deposition (MLD), (2) chemical vapor deposition (CVD) are addressed as emerging techniques.

引用

页码：584 / 592

页数：9

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