High performance symmetric supercapacitors based on Au incorporated CrN thin films fabricated by reactive magnetron sputtering

Recently, transition metal nitrides are being investigated extensively as potential supercapacitor material. In the present study, Au incorporated CrN (Au_CrN) thin films have been synthesized using reactive magnetron co-sputtering technique for application as supercapacitor electrode material. Films have been prepared at different Ar to N-2 flow rates keeping total deposition pressure constant to achieve the required structural phase in the sample. Electrochemical properties of the deposited materials have been investigated with a three-electrode system in 0.5 M H2SO4 aqueous electrolyte. The CrN thin film deposited under 3:1 Ar: N-2 partial pressure or flow rate ratio shows the highest specific capacitance. Upon Au incorporation, the film shows an areal capacitance of 56.8 mFcm(-2) at 1.0 mAcm(-2)discharge current density which is an almost nine-fold enhancement in specific capacitance value compared to pristine CrN sample. Symmetric supercapacitors have also been developed by sandwiching two identical Au_CrN thin film electrodes, which have found to deliver excellent specific capacitance of 86.03 mFcm(-2) at 1.0 mAcm(-2) discharge current density with no decline in capacitance value till 20,000 cycles. Furthermore, it can deliver a high energy density of 52.02mWhcm(-2) and a power density of 0.12mWcm(-2). The electrochemical properties of the supercapacitors fabricated with the Au_CrN thin film electrodes are found to be better than most of the results reported so far in the literature with CrN electrodes. Results of the present study clearly demonstrate that these Au enhanced CrN films prepared by easily scalable and highly reproducible magnetron sputtering technique have great potential as a high capacitance supercapacitor electrode material.