共 50 条
- [1] Nucleation-driven ferroelectric phase formation in ZrO2 thin films - What is different in ZrO2 from HfO2 ? -2018 IEEE 2ND ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM 2018), 2018, : 116 - 118Shibayama, Shigehisa论文数: 0 引用数: 0 h-index: 0机构: Univ Tokyo, Tokyo, Japan Univ Tokyo, Tokyo, JapanNishimura, Tomonori论文数: 0 引用数: 0 h-index: 0机构: Univ Tokyo, Tokyo, Japan Univ Tokyo, Tokyo, JapanMigita, Shinji论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, AIST, Tokyo, Japan Univ Tokyo, Tokyo, JapanToriumi, Akira论文数: 0 引用数: 0 h-index: 0机构: Univ Tokyo, Tokyo, Japan Univ Tokyo, Tokyo, Japan
- [2] Thin films of HfO2 and ZrO2 as potential scintillatorsNUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2005, 537 (1-2): : 251 - 255Kirm, M论文数: 0 引用数: 0 h-index: 0机构: Univ Hamburg, Inst Phys Expt, D-22761 Hamburg, GermanyAarik, J论文数: 0 引用数: 0 h-index: 0机构: Univ Hamburg, Inst Phys Expt, D-22761 Hamburg, GermanyJürgens, M论文数: 0 引用数: 0 h-index: 0机构: Univ Hamburg, Inst Phys Expt, D-22761 Hamburg, GermanySildos, I论文数: 0 引用数: 0 h-index: 0机构: Univ Hamburg, Inst Phys Expt, D-22761 Hamburg, Germany
- [3] Accelerated ferroelectric phase transformation in HfO2/ZrO2 nanolaminatesAPPLIED PHYSICS EXPRESS, 2021, 14 (05)Migita, Shinji论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, JapanOta, Hiroyuki论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, JapanAsanuma, Shutaro论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, JapanMorita, Yukinori论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, JapanToriumi, Akira论文数: 0 引用数: 0 h-index: 0机构: Univ Tokyo, Dept Mat Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan Natl Inst Adv Ind Sci & Technol, 1-1-1 Umezono, Tsukuba, Ibaraki 3058568, Japan
- [4] Achieving excellent ferroelectric and dielectric performance of HfO2/ZrO2/HfO2 thin films under low operating voltageJOURNAL OF ALLOYS AND COMPOUNDS, 2023, 968Yan, Fei论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R ChinaLiao, Jiajia论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R ChinaCao, Ke论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R ChinaJia, Shijie论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R ChinaZhou, Yichun论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R ChinaLiao, Min论文数: 0 引用数: 0 h-index: 0机构: Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China Xidian Univ, Sch Adv Mat & Nanotechnol, Shaanxi Key Lab High Orbits Electron Mat & Protect, Xian 710126, Peoples R China
- [5] Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin filmsDALTON TRANSACTIONS, 2009, (04) : 654 - 663Pothiraja, Ramasamy论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyMilanov, Andrian论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyParala, Harish论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyWinter, Manuela论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyFischer, Roland A.论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyDevi, Anjana论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany
- [6] A fluorite-structured HfO2/ZrO2/HfO2 superlattice based self-rectifying ferroelectric tunnel junction synapseMaterials Horizons, 2024, 11 (21) : 5251 - 5264Lee, Dong Hyun论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofKim, Ji Eun论文数: 0 引用数: 0 h-index: 0机构: Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul,02792, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofCho, Yong Hyeon论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofKim, Sojin论文数: 0 引用数: 0 h-index: 0机构: Division of Materials Science and Engineering, Hanyang University, Seoul,04763, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofPark, Geun Hyeong论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofChoi, Hyojun论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofLee, Sun Young论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofKwon, Taegyu论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofKim, Da Hyun论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofJeong, Moonseek论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofJeong, Hyun Woo论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofLee, Younghwan论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Chonnam National University, Gwangju,61186, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofLee, Seung-Yong论文数: 0 引用数: 0 h-index: 0机构: Division of Materials Science and Engineering, Hanyang University, Seoul,04763, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofYoon, Jung Ho论文数: 0 引用数: 0 h-index: 0机构: School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon,16419, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic ofPark, Min Hyuk论文数: 0 引用数: 0 h-index: 0机构: Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of Institute of Engineering Research, College of Engineering, Seoul National University, Gwanak-Ro 1 Gwanak-Gu, Seoul,08826, Korea, Republic of Department of Materials Science and Engineering, Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul,08826, Korea, Republic of
- [7] Phase transitions in ferroelectric ZrO2 thin filmsMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2024, 172Pereira, Rui M. P.论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalIstrate, Marian C.论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Mat Phys, 105 Bis Atomistilor, Magurele 077125, Romania Univ Bucharest, Fac Phys, Atomistilor 405,Magurele Ilfov, Magurele Ilfov 077125, Romania Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalFigueiras, Fabio G.论文数: 0 引用数: 0 h-index: 0机构: Univ Porto, IFIMUP, Rua Campo Alegre 687, P-4169007 Porto, Portugal Univ Porto, Dept Fis & Astron, Fac Ciencias, Rua Campo Alegre 687, P-4169007 Porto, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalLenzi, Veniero论文数: 0 引用数: 0 h-index: 0机构: Univ Aveiro, Aveiro Inst Mat, Dept Chem, CICECO, Aveiro P-3810193, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalSilva, Bruna M.论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalBenamara, Majdi论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalRomanyuk, Konstantin N.论文数: 0 引用数: 0 h-index: 0机构: Univ Aveiro, Dept Phys, P-3810193 Aveiro, Portugal Univ Aveiro, Aveiro Inst Mat, CICECO, P-3810193 Aveiro, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalGhica, Corneliu论文数: 0 引用数: 0 h-index: 0机构: Natl Inst Mat Phys, 105 Bis Atomistilor, Magurele 077125, Romania Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalAlmeida, Bernardo G.论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalMarques, Luis论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalPereira, Mario论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, PortugalSilva, Jose P. B.论文数: 0 引用数: 0 h-index: 0机构: Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Porto Univ CF UM UP, Campus Gualtar, P-4710057 Braga, Portugal Univ Minho, Lab Phys Mat & Emergent Technol, LapMET, P-4710057 Braga, Portugal Univ Minho, Phys Ctr Minho, Campus Gualtar, P-4710057 Braga, Portugal
- [8] Novel mononuclear alkoxide precursors for the MOCVD of ZrO2 and HfO2 thin filmsCHEMICAL VAPOR DEPOSITION, 2002, 8 (04) : 163 - 170Williams, PA论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, England Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandRoberts, JL论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandJones, AC论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandChalker, PR论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandTobin, NL论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandBickley, JF论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandDavies, HO论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandSmith, LM论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, EnglandLeedham, TJ论文数: 0 引用数: 0 h-index: 0机构: Univ Liverpool, Dept Chem, Liverpool L69 3ZD, Merseyside, England
- [9] MOCVD of ZrO2 and HfO2 thin films from modified monomeric precursorsCHEMICAL VAPOR DEPOSITION, 2006, 12 (2-3) : 172 - 180Patil, U论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyThomas, R论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyMilanov, A论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyBhakta, R论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyEhrhart, P论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyWaser, R论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyBecker, R论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyBecker, HW论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyWinter, M论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyMerz, K论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyFischer, RA论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, GermanyDevi, A论文数: 0 引用数: 0 h-index: 0机构: Ruhr Univ Bochum, Lehrstuhl Anorgan Chem 2, D-44780 Bochum, Germany
- [10] Luminescence of ZrO2 and HfO2 thin films implanted with Eu and Er ionsPHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4, NO 3, 2007, 4 (03): : 938 - +论文数: 引用数: h-index:机构:Kiisk, V.论文数: 0 引用数: 0 h-index: 0机构: Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, Estonia Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, EstoniaAarik, J.论文数: 0 引用数: 0 h-index: 0机构: Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, Estonia Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, EstoniaKirm, M.论文数: 0 引用数: 0 h-index: 0机构: Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, Estonia Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, EstoniaSildos, I.论文数: 0 引用数: 0 h-index: 0机构: Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, Estonia Univ Tartu, Inst Phys, Riia 142, EE-51014 Tartu, Estonia