An Online Gate Oxide Degradation Monitoring Method for SiC MOSFETs Based on Turn-ON Gate Voltage Filtering

被引:2
|
作者
Liu, Jiahong [1 ]
Yao, Bo [1 ]
Wei, Xing [1 ]
Zhang, Yichi [1 ]
Wang, Huai [1 ]
机构
[1] Aalborg Univ, Dept Energy, DK-9220 Aalborg, Denmark
关键词
Bandpass filter; condition monitoring (CM); gate oxide; gate voltage; reliability; SiC MOSFET; JUNCTION TEMPERATURE-MEASUREMENT; PARAMETERS;
D O I
10.1109/TPEL.2024.3363421
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter proposes an SiC mosfet gate oxide degradation monitoring method based on the peak value of the bandpass filtered gate voltage during turn-on transitions. The frequency range of the bandpass filter is determined to ensure a proper sensitivity of the detected peak value to the degradation level. The monitoring circuit is presented, including an analog bandpass filter, a peak detector, and a reset pulse generator. Comparing to the existing monitoring schemes, the proposed method is noninvasive and minimizes the interference and new risks to the normal operation of the gate driver. Besides, the proposed monitoring circuit is cost-effective with reduced complexity and less sampling frequency requirement. Multiple high-temperature gate bias tests are performed to accelerate the aging of SiC devices with planar, double trench, and asymmetric trench gate structures. Experimental results from a double pulse tester and a three-phase inverter under dynamic operation verify the effectiveness of the proposed health indicator and the monitoring circuit.
引用
收藏
页码:5020 / 5026
页数:7
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