An All-Region BSIM Thin-Film Transistor Model for Display and BEOL 3-D Integration Applications

被引:0
|
作者
Pahwa, Girish [1 ]
Salahuddin, Sayeef [2 ]
Hu, Chenming [2 ]
机构
[1] Natl Yang Ming Chiao Tung Univ, Int Coll Semicond Technol, Hsinchu 300093, Taiwan
[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
关键词
All-region compact model; back-end-of-line (BEOL) 3-D Integration; Berkeley short-channel IGFET model (BSIM); display thin-film transistor (TFT); field effect mobility; oxide semiconductors (OSs) Schottky contact resistance; TFT; trap limited conduction (TLC); AMORPHOUS-SILICON; ELECTRICAL CHARACTERISTICS; TEMPERATURE-DEPENDENCE; CRYSTALLINE;
D O I
10.1109/TED.2024.3416083
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This article introduces a compact model for single-gate and multigate thin-film transistors (TFTs) based on the Berkeley short-channel IGFET model-common multiple gate (BSIM-CMG) framework, valid in all regions of TFT operation. We develop a model for the channel charge density, including the impact of traps in the amorphous/polycrystalline channel of TFT, based on a linear potential profile approximation along the gate-normal direction. We further develop explicit, charge-based compact models for current and terminal charges. Unlike previous models, this model implicitly includes the impact of trap-limited conduction mechanism. In addition, we include the impact of Schottky source/drain contact resistances and temperature dependencies. The model is carefully validated with published experimental data of TFTs using diverse channel materials, including oxide semiconductors (OSs) and poly-Si, and various geometries, spanning applications in displays and emerging 3-D back-end-of-line (BEOL) integration scenarios.
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页码:4701 / 4709
页数:9
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