N-type ion implantation on femtosecond-laser-irradiated diamond surface

被引:0
|
作者
Okada, Tatsuya [1 ]
Iwaasa, Fumiya [2 ]
Sakurai, Yuuya [2 ]
Ueki, Tomoyuki [1 ]
Hisazawa, Hiromu [1 ]
Tomita, Takuro [1 ]
机构
[1] Tokushima Univ, Div Sci & Technol, Tokushima 7708506, Japan
[2] Tokushima Univ, Grad Sch Adv Sci & Technol, Tokushima 7708506, Japan
来源
关键词
Femtosecond laser; Diamond; N-type; Ion implantation; FIELD-EFFECT TRANSISTOR; ELECTRICAL-PROPERTIES; VOLTAGE; METAL; ACTIVATION; LAYERS; DAMAGE; B+;
D O I
10.1007/s00339-024-07791-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the effect of femtosecond laser irradiation on the incorporation of n-type forming ions (phosphorus ions, P + and nitrogen ions, N+) into diamond. The (001) surface of a diamond crystal was irradiated by using a femtosecond laser to draw a zigzag pattern in two areas in which the spacing between irradiation lines was controlled to be 2 mu m and 1 mu m. One half of the crystal surface was P+-implanted and the other half was N+-implanted, both at 600 degrees C. Electron diffraction patterns obtained from thinned samples showed that the crystallinity of diamond was lost in the densely laser-irradiated area. For both ions, the ion concentration in the laser-irradiated area was higher than that in the nonirradiated area. The highest ion concentration ratio was approximately 5 for the P+-implanted region and greater than 10 for the N+-implanted region. These results support the idea that femtosecond-laser-induced surface modifications can enhance incorporation of n-type forming ions into diamond, with the effect varying according to ion mass.
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页数:6
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