The assessment of potential risks of chloride salts and theireffect on seed germination and plant development

被引:0
|
作者
Voronina, L. P. [1 ,2 ]
Flerchuk, V. L. [1 ]
Ponogaybo, K. E. [2 ]
Sbitnev, A. V. [2 ]
Abdelkader, M. [1 ,3 ]
机构
[1] Lomonosov Moscow State Univ, 1-12 Leninskie Gory, Moscow 119991, Russia
[2] Ctr Strateg Planning FMBA Russia, 10-1 Pogodinskaya St, Moscow 119121, Russia
[3] Sohag Univ, Sohag 82524, Egypt
来源
关键词
deicing material (DM); sodium chloride; potassium chloride; seed germination; phytotoxicity; salinity;
D O I
10.25750/1995-4301-2024-1-156-165
中图分类号
Q14 [生态学(生物生态学)];
学科分类号
071012 ; 0713 ;
摘要
The article discusses the negative effect of de-icing materials (DM) and salts in their composition on plant seed-lings germination and development. The influence of sodium and potassium cations and chlorine anion on phytotoxicity index is considered. The dynamics of test-plants (Avena sativa L., Raphanus sativa L., Hordeum vulgare L.) response on a number of test-indicators depending on the concentration of basic salts in DM by a promising method of phytotesting was analyzed. The analyzed DMs in concentrations higher than 1% have an inhibitory effect. The DM at 14-16 g/L sup-presses root length of test plants (more than 50%) relative to the control. The low content of heavy metals, such as Cd, Cu, Pb, in the analyzed DM samples indicates the toxicity of sodium chloride as an active de-icing agent. The results of statistical analysis convincingly prove the high phytotoxicity of sodium chloride (NaCl) in relation to such indicators of the juvenile test-plant development as germination, the primary root length and the coleoptile height. Increasing the NaCl concentration in the solution from 0.75 to 1% was strongly toxic to the test-plants (more than 50%). Potassium chloride (KCl) in the concentration range of 0.1-1.0% showed no phytotoxicity. The KCl presence in the NaCl-included de-icing reagent reduces its phytotoxicity and allows the toxicity level of the agent to be assessed as "moderately toxic".
引用
收藏
页码:156 / 165
页数:10
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