Simulation Study of 4H-SiC Low Turn-Off Loss and Snapback-Free Reverse-Conducting Gate Turn-Off Thyristor with N-Float Structure
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作者:
Wu, Chengcheng
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China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Wu, Chengcheng
[1
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Li, Juntao
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China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Li, Juntao
[1
,2
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Li, Zhiqiang
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China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Li, Zhiqiang
[1
,2
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Zhang, Lin
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China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Zhang, Lin
[1
,2
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Zhou, Kun
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China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Zhou, Kun
[1
,2
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Deng, Xiaochuan
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Univ Elect Sci & Technol China, Sch Integrated Circuits Sci & Engn, Chengdu 610054, Peoples R ChinaChina Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
Deng, Xiaochuan
[3
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机构:
[1] China Acad Engn Phys, Inst Elect Engn, Mianyang 621900, Peoples R China
[2] China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Peoples R China
[3] Univ Elect Sci & Technol China, Sch Integrated Circuits Sci & Engn, Chengdu 610054, Peoples R China
In this study, a novel integrated 4H-SiC reverse-conducting gate turn-off thyristor (GTO) featuring an N-type floating (NF) structure is proposed. The proposed NF-structured 4H-SiC GTO outperforms conventional reverse-conducting GTOs in forward conduction, effectively eliminating the snapback phenomenon. This is achieved by increasing lateral resistance above the P-injector and modifying the electron current path during early turn-on. NF structures with a doping concentration of 2 x 1014 cm-3 and thicknesses exceeding 4 mu m have been indicated to successfully eliminate the snapback phenomenon. Moreover, the anode-shorted structure enhances the GTO's breakdown voltage and concurrently reduces turn-off losses by 85% at low current densities.