Gate Width Influence on Subthreshold Swing of AlGaN/GaN HEMTs

被引:0
|
作者
Ji Q.-Z. [1 ,2 ]
Liu J. [3 ]
Yang M. [4 ]
Ma G.-L. [1 ]
Hu X.-F. [1 ]
Liu S.-H. [1 ]
机构
[1] Army Engineering University, National Key Laboratory on Electromagnetic Environment Effects, Shijiazhuang Campus, Hebei, Shijiazhuang
[2] Beijing Institute of Spacecraft Environment Engineering, Beijing
[3] School of Electronics & Information Engineering, Nanjing University of Information Science & Technology, Jiangsu, Nanjing
[4] Beijing Orient Institute of Measurement and Test, Beijing
来源
基金
中国国家自然科学基金;
关键词
AlGaN/GaN high electron mobility transistors; polarization; scattering; subthreshold swing;
D O I
10.12263/DZXB.20230004
中图分类号
学科分类号
摘要
AlGaN/GaN high electron mobility transistors (HEMTs) with different gate widths are prepared. The gate-channel carrier transport characteristics and the subthreshold swing (SS) are obtained by measuring the capacitance-voltage curve and transfer characteristic curve of each HEMT. The results show that the SS value decreases by 40.3% with gate width increasing from 10 μm to 50 μm. The factors affecting the subthreshold swing variation are analyzed qualitatively and quantificationally. It is found that different gate widths correspond to different polarization scattering intensity, and the SS behavior results from gate-channel carrier transport characteristics and polarization scattering effect. This provides a new perspective and dimension for AlGaN/GaN HEMTs switching performance optimization, which will promote its better application in wireless communication, power transmission and defense industry. © 2023 Chinese Institute of Electronics. All rights reserved.
引用
收藏
页码:1486 / 1492
页数:6
相关论文
共 26 条
  • [1] NGUYEN H Q, NGUYEN T, TANNER P, Et al., Piezotronic effect in a normally off p-GaN/AlGaN/GaN HEMT toward highly sensitive pressure sensor, Applied Physics Letters, 118, 24, (2021)
  • [2] NARANG K, BAG R K, SINGH V K, Et al., Improvement in surface morphology and 2DEG properties of AlGaN/ GaN HEMT, Journal of Alloys and Compounds, 815, (2020)
  • [3] MOON J S, WONG J, GRABAR B, Et al., 360 GHz fMAX graded-channel AlGaN/GaN HEMTs for mmW low-noise applications, IEEE Electron Device Letters, 41, 8, pp. 1173-1176, (2020)
  • [4] JING X D, WANG H L, YOU F, Et al., Method for life evaluation of spaceborne high power GaN solid state power amplifier, Spacecraft Environment Engineering, 38, 4, pp. 420-425, (2021)
  • [5] JI Q Z, LIU J, YANG M, Et al., Review of proton irradiation effect to AlGaN/GaN HEMT, Spacecraft Environment Engineering, 39, 4, pp. 436-445, (2022)
  • [6] LEE H P, BAYRAM C., Improving Current ON/OFF ratio and subthreshold swing of Schottky- gate AlGaN/GaN HEMTs by postmetallization annealing, IEEE Transactions on Electron Devices, 67, 7, pp. 2760-2764, (2020)
  • [7] KIM K, KIM T J, ZHANG H L, Et al., AlGaN/GaN Schottky-gate HEMTs with UV/O <sub>3</sub> -treated gate interface, IEEE Electron Device Letters, 41, 10, pp. 1488-1491, (2020)
  • [8] DEGUCHI T, KIKUCHI T, ARAI M, Et al., High on/off current ratio p-InGaN/AlGaN/GaN HEMTs, IEEE Electron Device Letters, 33, 9, pp. 1249-1251, (2012)
  • [9] YANG L, MI M H, HOU B, Et al., Improvement of subthreshold characteristic of gate-recessed AlGaN/GaN transistors by using dual-gate structure, IEEE Transactions on Electron Devices, 64, 10, pp. 4057-4064, (2017)
  • [10] YUAN L, CHEN H W, CHEN K J., Normally off AlGaN/ GaN metal - 2DEG tunnel-junction field-effect transistors, IEEE Electron Device Letters, 32, 3, pp. 303-305, (2011)