K-shell excitation dielectronic recombination resonance strengths of highly charged Helike to O-like Xe ions

被引:0
|
作者
徐天衡 [1 ]
熊刚 [1 ,2 ]
肖君 [1 ]
杨洋 [1 ]
Roger HUTTON [1 ]
邹亚明 [1 ]
姚科 [1 ]
机构
[1] Shanghai EBIT Laboratory, Institute of Modern Physics, and Key Laboratory of Nuclear Physics and Ionbeam Application (MOE), Fudan University
[2] Research Center of Laser Fusion, China Academy of Engineering
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中图分类号
O53 [等离子体物理学];
学科分类号
070204 ;
摘要
Dielectronic recombination is an important process in high temperature plasmas. In the present work, the KLn(n?=?L, M, N and O) DR resonance strengths of He-like to O-like xenon ions are measured at the Shanghai electron beam ion trap using a fast electron beam energy scanning method. The experiment uncertainty reaches about 6% with significant improvement of statistics.A relativistic configuration interaction calculation is also made. Theoretical results agree with the experiment results within 15% in most cases.
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页码:76 / 80
页数:5
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